Multiple-Tool Customers Transition to Rudolph Technologies' MetaPULSE-II Metrology System
FLANDERS, N.J., May 21 /PRNewswire-FirstCall/ -- Rudolph Technologies, Inc. (Nasdaq: RTEC - News), a worldwide leader in the design, development, manufacture and support of high-performance process control metrology systems used by semiconductor device companies, today announced at its annual shareholders' meeting that certain multiple-tool customers have transitioned to the Company's MetaPULSE-II metrology system. Introduced in 2001, MP-II incorporates experience gained from over 200 customer-years of collaborating with major logic, ASIC, and memory manufacturers worldwide.
Speaking to shareholder's, Mr. Paul F. McLaughlin, Chairman and CEO of Rudolph Technologies, commented that Rudolph continues to win competitive business at the engineering level in both transparent and opaque thin film applications. We are particularly pleased to see the migration from MetaPULSE I to MetaPULSE II, which incorporates completely redesigned second-generation PULSE Technology. Customers are seeing the value in Rudolph's latest opaque metrology tools specifically for varying-density copper lines wrapped with low k interlayer dielectrics. MP II has unique advantages for companies migrating to copper. Recent orders for MP II from leading manufacturers in Taiwan and Japan reinforce the belief that foundry and logic manufacturers will be early beneficiaries of this leading-edge technology. These MP II shipments are scheduled for later this year.
By working in close collaboration with its customers, including all of the top 10 and 14 of the top 16 largest device manufacturers worldwide, the Company has been able to anticipate the price, performance and functionality requirements for metrology tools and has been able to convince these manufacturers to evaluate Rudolph's latest tools.
About Rudolph Technologies
Rudolph is a worldwide leader in the design, development, manufacture and support of high-performance process control metrology systems used by semiconductor device manufacturers. The Company provides a full-fab solution through its families of proprietary systems for both transparent and opaque thin film measurement. Rudolph's product development has successfully anticipated and addressed many emerging trends that are driving the semiconductor industry's growth. The Company's success in creating complementary metrology applications through aggressive research and development is key to Rudolph's strategy for continued technological and market leadership.
This press release contains forward-looking statements, including statements related to our anticipated leadership position in an industry recovery, and our revenue and earnings expectations for the first quarter and full year of 2002. Actual results may differ materially from those projected due to a number of risks, including the impact of the slowdown in the overall economy and the uncertainty of the current global political environment following the recent terrorist attacks, changes in customer demands for our existing and new products, the timing, cancellation or delay of customer orders and shipments and the timing of revenue recognition of shipments, new product offerings from our competitors, changes in or an inability to execute Rudolph Technologies' business strategy, unanticipated manufacturing or supply problems, and changes in tax rules. Rudolph Technologies cannot guarantee future results, levels of activity, performance or achievements. The matters discussed in this press release also involve risks and uncertainties summarized under the heading "Risk Factors" in Rudolph Technologies' Form 10K filed for the year ended December 31, 2001. These factors are updated from time to time through the filing of reports and registration statements with the Securities and Exchange Commission. Rudolph Technologies does not assume any obligation to update the forward-looking information contained in this press release.
SOURCE: Rudolph Technologies, Inc. |
