KLA-Tencor's Real-Time Overlay Metrology Analysis Enables Advanced Process Control For 300-mm And Sub-130-nm Device Production
Archer Analyzer Software Provides Critical Feedback to Improve APC Performance and Reduce Unnecessary Wafer Rework
SAN JOSE, Calif., July 8 /PRNewswire-FirstCall/ -- KLA-Tencor Corp. (Nasdaq: KLAC - News) today unveiled Archer Analyzer -- a new software feature for the company's Archer 10 optical overlay metrology system that conducts fully automated, real-time, on-tool overlay metrology analysis. Seamlessly integrated with the Archer 10, Archer Analyzer provides mission-critical information for wafer lot dispositioning and stepper correction, which is essential for establishing an advanced process control (APC) framework in advanced 300-mm fabs. With this framework in place, chipmakers can reduce unnecessary rework and quickly address variations in the performance of their lithography tools to reduce cycle times, optimize device performance and increase yields.
"Below the 0.13-micron node, lithography process margins become so narrow that a slight deviation in overlay control could spell disaster for our customers' production yields. This is especially critical when transitioning to 300-mm wafers, where more than twice as much product is at risk per wafer," stated Dr. Ami Appelbaum, vice president and general manager of KLA-Tencor's Optical Metrology Division. "Our Archer 10 system has been extremely successful in enabling our customers to achieve tighter overlay control at these smaller geometries. With the introduction of Archer Analyzer, we've brought critical new capabilities to the Archer 10 to make our customers' lithography processes even more robust, and to help them reap even greater financial rewards through accelerated yield learning and faster time to market on their latest-generation devices."
Shrinking process windows, coupled with the increasing complexity of the lithography process, have imposed tighter tolerances on layer-to-layer, or overlay, matching on semiconductors. The transition to 300-mm manufacturing places an additional degree of complexity on overlay matching, since the effect of overlay errors-such as scale and rotation-is directly proportional to the diameter of the wafer. As a result, a higher degree of overlay precision is needed at 300-mm to control these wafer size-based errors, as compared to at 200-mm.
Overlay metrology tools, like KLA-Tencor's Archer 10 system, have played an important role in monitoring wafers in the production line to ensure that overlay errors are caught before they can impact device yields. Finding these errors is only part of the solution, however. Chipmakers need to determine their source, which can be a labor-intensive and time-consuming process that lowers productivity in the lithography cell and puts material at risk, eating directly into the chipmaker's bottom line. Archer Analyzer provides real-time overlay metrology analysis while the Archer 10 is in use-giving engineers immediate feedback on the performance of their lithography tools. This enables them to correct overlay errors quickly and reduce unnecessary wafer rework, thereby ensuring that optimal productivity and tight process control are both maintained in the lithography cell.
As Archer Analyzer is seamlessly integrated with Archer 10, it uses the same interface to connect to the customer's factory automation system, eliminating the need to integrate a separate data path for analysis. It incorporates advanced algorithms and data filters to assess the results provided by the Archer 10 to determine if a wafer lot has met, or failed to meet, predetermined parameters. Taking the raw data collected by the Archer 10, Archer Analyzer generates statistics, overlay parameters and other essential information that chip manufacturers need to make adjustments to correct their out-of-spec lithography systems. Archer Analyzer incorporates the latest lithography stepper and scanner models to stay updated with state-of-the-art advances in photolithography. It also allows for custom models for added flexibility.
Customers can also use Archer Analyzer off-line to conduct more extensive engineering analysis. An advanced data query engine enables multiple users to access critical information-such as analysis results, historical lot data, tool recipes and stepper models-simultaneously from any desktop connected to the fab network. Users can thus set up analysis recipes and stepper models, troubleshoot problem lots through lot history and commonality analysis, and more easily monitor the entire lithography cell.
KLA-Tencor will showcase the Archer Analyzer and Archer 10 at the SEMICON West 2002 exhibition in San Francisco, Calif., July 22-24, at the Moscone Convention Center. KLA-Tencor's booth is located in the South Hall, #426.
About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, Calif., with operations around the world, KLA-Tencor ranked #6 on S&P's 2002 index of the top 500 companies in the U.S. KLA-Tencor is traded on the Nasdaq National Market under the symbol KLAC. Additional information about the company is available on the Internet at kla-tencor.com .
SOURCE: KLA-Tencor Corp. |
