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Technology Stocks : General Lithography

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To: Jurgis Bekepuris who wrote (471)	7/17/1997 2:46:00 AM
From: Yousef	of 1305

Raimondas, Re: " Can SVGI (or others) extend the life of "mercury arc lamp" source to .25 and .18um" The answer, I am afraid, is no. To move from .25um to .18um, you either need a very high numerical aperature (NA) at 248nm or you need 193nm illumination. For very high NA optics, it is important to have very narrow wavelength dispersion (248nm +- .0005nm) to design the optics. A mecury (or NiCd) bulb can not be filtered to this tight tolerance. Also at 193nm, an arc lamp has very little output. So in both case, a laser is the best choice for the illumination source. I believe the answer to your second question is that this should read ASML wide field I-line steppers for non-critical layers. I beleive that ASML is also working on an I-Line scanner to match the field size of the DUV scanners. The answer to your third question is that the best resist tracks, IMO, are made by DNS and TEL. These are both Japanese vendors. Yousef

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