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To: WALLY THE SANDCRAB who wrote (474)	7/17/1997 10:20:00 AM
From: Yousef	of 1305

Wally, Re: "using i-line steppers as mix and match for non-critical layers. " I-Line tools will be used for the non-critical and some "near critical" layers in a .25um process. Let me explain, a critical layer exists because of either the need for minimum resolution or tight alignment tolerances. So for Poly, Contact, Metal 1, and Via 1, these require both narrow lines/spaces and tight alignment. Island/Trench needs to be critical for the narrow spaces (trenches). All the other ~14 Mask layers have more relaxed resolution but some of them require fairly tight alignment. When this occurs, the matching of steppers OR stepper-to-scanner is an important issue. Only vendors that make both DUV and I-Line will give specs for matching THEIR equipment only. If you want to match a Nikon with an Ultratech, then you are on your own. Most Fabs will want to stay with their DUV vendor's I-Line tool for this reason (as well as lower COO by working with same vendor ...). Since SVGL doesn't make I-Line tools then, this might be an opportunity for UTEK. In Intel's case, they match SVGL with I-Line Nikons. Yousef

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