Varian Semiconductor Awarded Beam Current Sensor Patent
Optimizes Beam Set-Up Time for Greater Throughput
Tuesday September 10, 11:45 am ET
GLOUCESTER, Mass.--(BUSINESS WIRE)--Sept. 10, 2002--Varian Semiconductor Equipment Associates, Inc. (Nasdaq: VSEA - News), the leading supplier of ion implantation systems, today announced that it has been issued U.S. Patent Number 6,403,972 for "Methods and Apparatus for Alignment of Ion Beam Systems Using Beam Current Sensors."
This new technology uses beam current sensors throughout the beamline for alignment and pre-calibration of the beam optics. "Pre-calibrating the magnets in the beamline minimizes the beam optimization time during set-up resulting in significant increases in machine throughput," said Alan Sheng, Ph.D., Varian Semiconductor's vice president of engineering. "Our VIISta 810 and VIISta 810 HP customers enjoy these important cost of ownership benefits."
The beam current sensors are used in the Company's single wafer VIISta 810 and VIISta 810 HP medium current ion implanters. This unique technology is part of the VIISta platform single wafer advantage that includes unprecedented precision in dopant placement at "atomic level precision" through total incident angle control and dose control. In addition, the VIISta platform also offers individual wafer statistical process control, enhanced productivity, and increased process flexibility for advanced applications including high tilt halo implants, and a substantial reduction in contamination to enhance device yields.
About Varian Semiconductor
Varian Semiconductor Equipment Associates is the leading producer of ion implantation equipment used in the manufacture of semiconductors. The company is headquartered in Gloucester, Massachusetts, and operates worldwide. Varian Semiconductor maintains a web site at www.vsea.com. The information contained in the company's web site is not incorporated by reference into this release, and the web site address is included in this release as an inactive textual reference only.
Note: This release contains forward-looking statements for purposes of the safe harbor provisions under The Private Securities Litigation Reform Act of 1995. For this purpose, the statements concerning the company's expectations regarding the invention discussed in this release, market share and technology leadership, technological capabilities and benefits are forward-looking statements and any statements using the terms "believes," "anticipates," "expects," "plans," or similar expressions are forward-looking statements. There are a number of important risks and factors that could cause actual events to differ materially from those suggested or indicated by such forward-looking statements. These include, among others, volatility in the semiconductor equipment industry; economic conditions in general and as they affect the company's customers; significant fluctuations in the company's quarterly operating results; the impact of rapid technological change; the company's dependence on the development and introduction of new products; the company's concentration on ion implantation systems and related products; concentration in the company's customer base and lengthy sales cycles; the highly competitive market in which the company competes; risks of international sales; foreign currency risks; and general economic conditions; and other factors identified in the company's Annual Report on Form 10-K, and the most recent Quarterly Reports on Form 10-Q filed with the Securities and Exchange Commission. The company cannot guarantee any future results, levels of activity, performance or achievement. The company undertakes no obligation to update any of the forward-looking statements after the date of this press release. |
