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Technology Stocks : General Lithography

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To: Jeffrey S. Mitchell who wrote (488)	7/24/1997 9:58:00 PM
From: Yousef	of 1305

Jeff, Re: "EUV vs XRL according to Dvorak ..." I'm surprised by a couple of things in this article and it makes me wonder how close Dvorak is to lithography technology. First, studies of glass degradation at 193nm are well underway at Lincoln Labs (LL) and the result have looked very good with all major optics vendors supplying samples. So, I disagree that .18um will be that much of a stretch. In fact, most processes will start .18um development on 248nm scanners and then transition to 193nm scanners for production. Secondly, there will be a major symposium/conference later this year to develop a consensus on the most likely to succeed technology after 193nm. This is being driven by SEMATECH and will include most US IC producers and other WW producers. My expectation is that EUV will be the path of choice. This would mean that the R&D money that is now being spent on other techniques (x-ray, SCAPEL ...) would be cut back. Dvorak does point out correctly that R&D spending in the US on basic research has declined significantly with the change of focus at Bell Labs, Watson Reaserch Center ... Yousef

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