Varian Semiconductor Announces High Current, High Energy and Medium Current Ion Implant Win from a Major U.S. Memory Producer
Wednesday December 18, 8:31 am ET
Single Wafer Technology Key Factor in Tool Selection
GLOUCESTER, Mass.--(BUSINESS WIRE)--Dec. 18, 2002--Varian Semiconductor Equipment Associates, Inc. (Nasdaq: VSEA - News), the leading supplier of ion implantation systems, today announced that it has won high current, high energy and medium current energy ion implant business from a major U.S. memory producer.
This strategic 300mm win consists of a platform of VIISta tools including VIISta 80 high current, VIISta 3000 high energy and VIISta 810 HP medium current systems, making it a complete 300mm VIISta platform order shipped.
Varian Semiconductor has a long-time strategic relationship with this customer, helping them to provide leading-edge technology today as well as supporting their future technology roadmap. "We believe the clear message behind this order for a full suite of VIISta tools is that advanced devices require the implant angle precision, tool-to-tool repeatability, cleanliness and higher productivity advantages of single wafer ion implantation," said John Aldeborgh, Varian Semiconductor's vice president of sales and marketing. "The VIISta platform of single wafer ion implanters provides the productivity and cost advantages that are critical to tool selection. We believe these shipments demonstrate that major device manufacturers now recognize that only single wafer processing can support future advanced technologies."
"Shipping our first 300mm VIISta platform order to this world-leading memory producer is a significant step in our continuing efforts to maintain market share leadership," said Ernest Godshalk, president and chief operating officer of Varian Semiconductor. "This customer is developing sub-130nm device technologies enabled by our VIISta 80, VIISta 3000 and VIISta 810 HP implanters to meet their 300mm production requirements."
Each implanter in the VIISta platform offers specific advantages in terms of integrated circuit performance. For high current implants, the VIISta 80 provides angle and dose control that enables dopant placement with atomic level precision to satisfy the increasing demand for accurate, repeatable zero degree implants. This provides customers with the capability for improved junction abruptness, resulting in increased device drive current and processing speed. For medium current implants, the VIISta 810 HP provides exceptional control of the Vt and halo implants, improving the consistency of operating characteristics and yield across the wafer. For high energy implants, the VIISta 3000 provides accuracy in the placement of dopant species to enhance well-to-well isolation characteristics, reducing the size of the transistors and potentially increasing the number of integrated circuits on a wafer.
About Varian Semiconductor
Varian Semiconductor Equipment Associates is the leading producer of ion implantation equipment used in the manufacture of semiconductors. The company is headquartered in Gloucester, Massachusetts, and operates worldwide. Varian Semiconductor maintains a web site at www.vsea.com. The information contained in the company's web site is not incorporated by reference into this release, and the web site address is included in this release as an inactive textual reference only.
Note: This release contains forward-looking statements for purposes of the safe harbor provisions under The Private Securities Litigation Reform Act of 1995. For this purpose, the statements concerning the company's expectations regarding the customer and products discussed in this release, market share and technology leadership, technological capabilities and benefits are forward-looking statements and any statements using the terms "believes," "anticipates," "expects," "plans," or similar expressions are forward-looking statements. There are a number of important risks and factors that could cause actual events to differ materially from those suggested or indicated by such forward-looking statements. These include, among others, volatility in the semiconductor equipment industry; economic conditions in general and as they affect the company's customers; significant fluctuations in the company's quarterly operating results; the impact of rapid technological change; the company's dependence on the development and introduction of new products; the company's concentration on ion implantation systems and related products; concentration in the company's customer base and lengthy sales cycles; the highly competitive market in which the company competes; risks of international sales; foreign currency risks; and general economic conditions; and other factors identified in the company's Annual Report on Form 10-K, and the most recent Quarterly Reports on Form 10-Q filed with the Securities and Exchange Commission. The company cannot guarantee any future results, levels of activity, performance or achievement. The company undertakes no obligation to update any of the forward-looking statements after the date of this press release. |
