Varian Semiconductor Wins Multiple 300mm High and Medium Current Ion Implanter Orders from Samsung Electronics
Wednesday January 22, 9:04 am ET
GLOUCESTER, Mass.--(BUSINESS WIRE)--Jan. 22, 2003--Varian Semiconductor Equipment Associates, Inc. (NASDAQ: VSEA - News), a leading supplier of ion implantation systems, today announced that it has won multiple VIISta 80 high current and VIISta 810 HP medium current ion implanter orders from Samsung Electronics Co. Ltd., the world's largest memory chipmaker.
The VIISta single wafer ion implanters will be installed at Samsung's 300mm mass production line in Hwasung, Korea.
Samsung's order is the latest in a series of account penetrations in Asia for Varian Semiconductor's VIISta 80 high current ion implanters. "This order represents another example of how our single wafer high current architecture delivers superior productivity and process capability, compared with previous generation multi-wafer processing systems," said John Aldeborgh, vice president of sales and marketing of Varian Semiconductor. "The VIISta 80 high current ion implanter delivers high productivity in decel mode with exceptional energy purity. It features Varian Semiconductor's unique dual magnet and broad ion beam architecture. Samsung recognizes the benefits of our powerful technology and continues to select Varian Semiconductor's tools to meet their production needs."
The VIISta 80 and VIISta 810 HP systems will join a fleet of Varian Semiconductor single wafer ion implanters already installed at Samsung. "We are extremely gratified that Samsung has again selected our VIISta 80 and VIISta 810 HP systems for 300mm DRAM and logic production," said Ernest Godshalk, president and chief operating officer of Varian Semiconductor. "These orders reinforce Varian Semiconductor's long-standing relationship with Samsung, and our global leadership in ion implant technologies."
Each implanter in the VIISta platform offers specific advantages in terms of integrated circuit performance. The VIISta 80's angle and dose control enables dopant placement with atomic level precision. This provides customers with the capability for improved junction abruptness, resulting in increased device drive current and processing speed. In addition, only the high current VIISta 80 single wafer tool provides the process flexibility for advanced applications such as high tilt halo implants, and the angle control to satisfy the increasing demand for accurate and repeatable zero degree implants. For medium current implants, the VIISta 810 HP provides exceptional control of the Vt and halo implants, improving the consistency of operating characteristics and yield across the wafer.
About Varian Semiconductor
Varian Semiconductor Equipment Associates is a leading producer of ion implantation equipment used in the manufacture of semiconductors. The company is headquartered in Gloucester, Massachusetts, and operates worldwide. Varian Semiconductor maintains a web site at www.vsea.com. The information contained in the company's web site is not incorporated by reference into this release, and the web site address is included in this release as an inactive textual reference only.
Note: This release contains forward-looking statements for purposes of the safe harbor provisions under The Private Securities Litigation Reform Act of 1995. For this purpose, the statements concerning the company's expectations regarding the ion implantation systems discussed in this release, market share and technology leadership, technological capabilities and benefits are forward-looking statements and any statements using the terms "believes," "anticipates," "expects," "plans," or similar expressions are forward-looking statements. There are a number of important risks and factors that could cause actual events to differ materially from those suggested or indicated by such forward-looking statements. These include, among others, volatility in the semiconductor equipment industry; economic conditions in general and as they affect the company's customers; significant fluctuations in the company's quarterly operating results; the impact of rapid technological change; the company's dependence on the development and introduction of new products; the company's concentration on ion implantation systems and related products; concentration in the company's customer base and lengthy sales cycles; the highly competitive market in which the company competes; risks of international sales; foreign currency risks; and general economic conditions; and other factors identified in the company's Annual Report on Form 10-K, and the most recent Quarterly Reports on Form 10-Q filed with the Securities and Exchange Commission. The company cannot guarantee any future results, levels of activity, performance or achievement. The company undertakes no obligation to update any of the forward-looking statements after the date of this release. |
