More news on Veeco (full story at: biz.yahoo.com
The story's about extreme UV lithography research results showing feasibility for the next generation of feature sizes:
<excerpt>
The breakthroughs were achieved under research
agreements in EUV lithography among eight U.S. firms
and three Department of Energy national labs, Lawrence
Livermore, Sandia and Lawrence Berkeley. The companies
are AT&T Corp, Intel Corp, Advanced Micro Devices Inc,
Ultratech Stepper Inc, Jmar Industries Inc, Tropel,
Micrion Corp of Massachusetts and KLA Instruments Corp.
One advance stems from an "ion beam sputter deposition
system" developed by Lawrence Livermore and Veeco
Instruments Inc, a Plainview, New York, semiconductor
equipment company. Compared with current technology,
this permits a 300,000-fold reduction in the number of
defects for the multilayer coated reflective masks used
to transfer circuit patterns onto silicon wafers or
chips, the lab said.
<end excerpt>
Let's hope the earnings reflect their leading-edge technology advantage! |
