Cymer Unveils the XLA 105 -- Extending DUV Lithography to 65-nm Regime
SAN DIEGO, Mar 2, 2004 (BUSINESS WIRE) -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, today introduced the XLA 105 argon fluoride (ArF) excimer light source, which is designed to support 65-nm photolithography applications. This second-generation ArF light source in the XL Series -- based on Cymer's revolutionary Master Oscillator Power Amplifier (MOPA) dual-gas-discharge-chamber technology -- is targeted at volume production of semiconductor devices for the 65-nm node and beyond. Delivering the highest output power and narrowest bandwidth in the industry, the XLA 105 leverages the production-proven XL Series platform to enable the lithography system solutions providers to achieve seamless integration and rapid time to market with their most advanced ArF scanners to meet the semiconductor industry's next-generation lithography needs.
According to Cymer President and Chief Operating Officer, Pascal Didier, Cymer is dedicated to developing its latest-generation, highly reliable lithography light sources to satisfy customers' needs, and bringing these products to market rapidly to enable its customers to achieve the greatest economic benefit possible."By integrating the XLA 105 into their most-advanced lithography tools targeted at the 65 nm node, our customers are better able to help chipmakers address next-generation lithography process applications, while simultaneously increasing overall wafer throughput and maintaining a low cost of operation."Operating at a 4 kHz repetition rate and delivering 40 W of output power, the XLA 105 is designed to provide full imaging capability for advanced 200 mm and 300 mm lithography scanners. By offering this feature at a very tight bandwidth -- less than or equal to 0.2 pm at full-width half maximum (FWHM) and less than or equal to 0.50 pm at 95 percent energy integral -- the XLA 105 enables exposure of the most critical semiconductor features with high numerical aperture (NA) lens designs. As a result of this high spectral bandwidth performance, these high NA lens designs require fewer calcium fluoride (CaF2) elements -- an important advantage given the current limited availability of CaF2 material and its high cost. In addition, the XLA 105 offers increased pulse duration of greater than or equal to 70 ns which helps reduce peak fluence for increased scanner optics lifetimes.
Cymer's XLA 105 light source is the latest addition to the company's product portfolio -- enabling robust DUV technology. Through its ongoing efforts in the area of technology innovation, Cymer is committed to helping chipmakers continue keeping pace with Moore's Law by speeding execution and time to market. |
