Submitted for review is this press release; read down to the Cal. RAM described. isnt that what we are? Does this imply anything in regards to Ovonic memory?
JMAR Improves CPL Reliability and Productivity for Sub-90 Nanometer X-Ray Lithography; Receives $1.6 Million in Funding from DARPA
SAN DIEGO, Apr 5, 2004 (BUSINESS WIRE) -- JMAR Technologies, Inc. (NASDAQ:
JMAR) reported that the recent endurance trial of its Collimated Plasma
Lithography (CPL(TM)) X-ray light source and wafer exposure system achieved
significantly improved reliability and productivity while printing sub-90
nanometer features. As a result of the Company's progress, Defense Advanced
Research Projects Agency (DARPA) released a new $1.6 million block of funding,
$800,000 of which was announced by the Company last week.
Repeating a five-day "Iron Man" trial, first carried out at JMAR's South
Burlington, VT facility in September 2003, CPL System testing in March 2004
yielded an 80% improvement in availability, a 40% reduction in exposure time per
field, and a 200% increase in overall productivity. With X-ray power of 10-12
watts sustained over a period of several days, beam-on time was limited only by
the copper tape target capacity of the beta-1 model configuration.
The large depth of field and short wavelength associated with X-ray lithography
makes CPL attractive for producing fine contact holes, vias, and
Chalcogenide-RAM features (C-RAM is a phase-change, nonvolatile semiconductor
memory technology offering the potential for faster write and erase speeds and
higher cycling endurance than conventional Flash memory). These tests confirmed
the value of those characteristics and suggested generous process latitude by
patterning both dense and sparse contacts within the same field. The tests also
produced 80 nm contact holes alongside complex 100 nm serpentine patterns.
A second CPL X-ray source, under development at JMAR's San Diego facility, has
demonstrated the operational benefits of several engineering improvements.
Stability measurements of X-ray power over several hours show continuous power
near 20 watts, converting 10% of the laser energy into X-rays. Improved copper
target delivery mechanisms, higher beam quality, better controlled laser pulse
timing, and laser beam overlap control point the way toward JMAR's goal of
eight-hour beam-on time between target changes for higher availability.
Ronald A. Walrod, JMAR's Chief Executive Officer, remarked, "We have made
significant improvements in CPL source power, reliability and productivity since
our September endurance tests. Last fall, we initiated work in San Diego to
develop a new CPL source to test important design improvements and aid in
trouble shooting the Vermont system. The improved results achieved by our March
tests of the integrated stepper system in Vermont and our continuing success
with the improved CPL source in San Diego, show that we are on the right track.
Although our work is not complete, we are pleased with our progress toward
meeting operational requirements. With expected DARPA funding of $5.4 million in
2004, we are continuing our work to improve CPL source reliability,
availability, power level and stability."
This work continues under contracts from Army Research Laboratory/Defense
Advanced Research Projects Agency.
Headquartered in San Diego, California, JMAR Technologies, Inc., develops,
manufactures, and supports advanced laser, automated alignment and positioning,
and sensor systems for applications in the semiconductor, biotech, homeland
security and nanotechnology markets. JMAR originated the Collimated Plasma
Lithography (CPL(TM)) light source for advanced semiconductor chip
manufacturing. JMAR's operations include its high brightness lasers and
laser-produced plasma technology at its Research Division in San Diego,
California; its Systems Division in Burlington, Vermont, which serves as JMAR's
product design and manufacturing arm, carrying out the engineering, production,
and integration of JMAR's CPL light sources and CPL stepper systems; and its
Microelectronics Division, based in Sacramento, California, where JMAR provides
process integration and maintenance support for the U.S. Government's Defense
Microelectronics Activity semiconductor fabrication facility. |
