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Technology Stocks : Energy Conversion Devices

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To: alfranco who wrote (7684)5/13/2004 9:01:32 PM
From: Krowbar   of 8393
 
Al, after reading Stan the alchemy man's patent for the 3rd time, I am not so sure that the process would take the 70 min. that I thought at first. The silicon is layed down as usual, then hit with different gasses for just a few seconds. It is then repeated as many times as desired. It mentions that the formation and treatment can be done in the same chamber. They mention the 70 min. as "total preparation time", which may include the time taken to load things manually. It doesn't make that clear.

Somebody needs to ask at the conference call whether this process can be done on our current machine or if it would need a new one or be modified. Also, how long before we manufacture panels with the new "coordinatively irregular" layer.

There are many variations of gas exposures, temperatures, pressures, etc., each leading to different properties. Microcrystals, porous silicon, amorphous and 2 dimensional crystals can be formed.

The patent refers back to a patent in 1992 when Stan was messing around with this. Presumably we should have the process refined enough where we can start laying miles of "crymorphous" silicon.

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