| | DuPont Photomasks Invests More Than $30 Million to Expand 90nm and 65nm Capabilities at Round Rock Facility
ROUND ROCK, Texas
DuPont Photomasks, Inc., Round Rock
Tom Blake, 512-310-6562
tom.blake@photomask.com
DuPont Photomasks, Inc. (NASDAQ:DPMI) said today it is installing at its advanced photomask production facility in Round Rock a leading-edge photomask production line to support semiconductor devices at volume production with 90nm design rules and prototype devices with 65nm design rules. The total investment represents more than $30 million.
The new manufacturing line will build photomasks according to semiconductor makers' specifications for imaging critical layers of leading-edge chips. The new line includes a JEOL JBX-3030MV e-beam pattern generator, a KLA-Tencor 576 inspection system, a Rave advanced repair system, a next-generation dry etcher and additional upgrades to process equipment.
The new line in Round Rock is expected to come on line quickly and ramp to commercial production volumes by early 2005. The installation and start-up processes will benefit from DuPont Photomasks' past development programs utilizing the principal components of the equipment set. The Company is currently operating a JBX-3030MV pattern generator in its Taiwan facility, and a KLA-Tencor 576 inspection system in its new Dresden, Germany campus, which is the most advanced photomask development and production center in the world.
The addition of this state-of-the-art equipment will significantly expand DuPont Photomasks' ability to offer volume photomask production at 90nm. Moreover, the new line will support 65nm prototyping and early production. The new production line in Round Rock will offer customers an additional option for supply of advanced photomask technologies within DuPont Photomasks' global network, thereby offering increased flexibility of multiple site qualifications.
"This upgrade at our advanced photomask production facility in Round Rock significantly enhances our ability to offer our customers throughout the world the very latest photomask technology for wafer production," said Jim Northup, chief operating officer of DuPont Photomasks. "But state-of-the-art tools are only part of the solution. The proprietary processes developed by our engineering teams will help ensure that customers get the highest-quality photomasks that increase wafer yield for semiconductor design nodes in production today, tomorrow and the years ahead."
About DuPont Photomasks, Inc.
DuPont Photomasks, Inc. is a leading global provider of microimaging solutions. The Company develops and produces advanced photomasks, a key enabling technology used in the manufacture of semiconductor and other microelectronic devices, and through its wholly owned subsidiary BindKey Technologies, Inc., electronic design automation (EDA) software. Headquartered in Round Rock, Texas, DuPont Photomasks operates a global network of manufacturing facilities serving semiconductor makers and other electronics producers around the world. DuPont Photomasks posted worldwide revenues of $354 million in fiscal 2004. Information about the Company can be found at www.photomask.com.
Forward-Looking Statements
Certain statements contained in this document that are not historical facts, are "forward-looking statements," as that term is defined in Section 27A of the Securities Act of 1933 and Section 21E of the Securities Exchange Act of 1934, that involve a number of risks and uncertainties. Such forward-looking statements may concern growth and future operating results, forecasts, projections, pricing pressures, potential acquisitions and joint ventures, new manufacturing facilities, capital expenditures, the global economic climate, new products and product enhancements, the future importance of photomask technology, the demand for products, competitive factors, research and development activities and expenditures, strategic relationships with third parties, liquidity, financing, and the Company's strategy. Such forward-looking statements are based upon management's current plans, expectations, estimates and assumptions and are subject to a number of risks and uncertainties. Actual events or results may differ materially from those described in this press release due to a number of risks and uncertainties. Additional risk factors affecting our business may include relationships with and dependence on the semiconductor industry, fluctuations in quarterly and annual earnings, operating in a capital intensive industry, significant fixed costs, rapid technological change, competition, significant international operations, worldwide market volatility, manufacturing risks, fluctuation of income tax rates, concentration of customers, dependence on suppliers, dependence on management and technical personnel, volatility of market prices, potential acquisitions or dispositions, technology challenges in the manufacture of advanced photomasks, intellectual property, changes in governmental laws and regulations, and the potential effect of shares eligible for future sales and registration rights. More information about potential factors that could affect DuPont Photomasks' business and financial results is included in DuPont Photomasks' Annual Report on Form 10-K for the fiscal year ended June 30, 2004, which is on file with the SEC and available at the SEC's website at www.sec.gov. The forward-looking statements are made as of the release date hereof and DuPont Photomasks disclaims any intention or obligation to update or revise any forward-looking statements or to update the reasons why the actual results could differ materially from those projected in the forward-looking statements, whether as a result of new information, future events or otherwise. |
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