Carl Zeiss opens imprint lithography demo lab
By Peter Clarke
Silicon Strategies
11/30/2004, 1:05 PM ET
OBERKOCHEN, Germany — The Nano Technology Systems Division (NTS) at Carl Zeiss SMT AG has opened a customer demo laboratory for sales support of Step & Flash Imprint Lithography (S-FIL) equipment from Molecular Imprints Inc. (MII).
NTS has installed clean rooms, imprint systems, manufacturing processes and measuring equipment in support of an Imprio 100 demo system from MII. In addition, it has developed a group of experts familiar with imprint lithography, Zeiss said.
A MII imprint machine and additional are due to be installed and first potential customer presentations are scheduled to take place in December. S-FIL is a step and repeat, nano-imprint lithography technology for the replication of micrometer- and nanometer-scale patterns in components, such as devices with optical and photonic structures, MEMS, NEMS, micro displays, compound semiconductor devices and others.
Carl Zeiss SMT AG has an equity stake in MII in 2003 and is exclusive distributor for MIIs systems in Europe.
"With the opening of the Carl Zeiss NTS demo facility in Oberkochen, we can now provide our European customers a high level of applications and technology support, similar to our US customers," said Norman Schumaker, chairman, CEO and president of MII, in a statement. |
