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Strategies & Market Trends : YEEHAW CANDIDATES
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To: Sergio H who wrote (6120)12/14/2004 2:07:40 PM
From: stevenallen  Read Replies (1) of 23958
 
1:17PM Tegal Corp awarded key patent for new Magnetron sputter source (TGAL) 1.86 +0.07: Co announces that it has been granted United States Patent #6,783,638 for the Flat Magnetron sputter source. The invention provides for the use of a greater percentage of the material from the sputter target than in existing conventional physical vapor deposition systems.
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