Since its introduction in 2000, the INOVA xT 300-mm platform has consistently led the industry in technology and productivity for copper logic applications, but is now seeing significant market traction for PVD aluminum applications as well. Hynix is the fifth semiconductor company in Asia to select the Inova xT for advanced 300-mm manufacturing in the past four (4) quarters.
Press Release Source: Novellus Systems, Inc.
Novellus PVD System Helps Hynix 300-mm DRAM Start-Up
Monday January 31, 8:52 pm ET
Korean Memory Manufacturer Fifth Asian Customer to Accept INOVA(R) System for PVD Aluminum Applications
SEOUL, South Korea, Jan. 31 /PRNewswire-FirstCall/ -- Novellus Systems, Inc. (Nasdaq: NVLS - News), the productivity and technology leader in advanced deposition, surface preparation and chemical mechanical planarization processes for the global semiconductor industry, today announced that its INOVA xT physical vapor deposition (PVD) system has been successfully qualified by Hynix for aluminum PVD applications at the DRAM manufacturer's 300-mm fab in Icheon, Korea. Chosen for its record of productivity and cost-efficiency in high-volume DRAM manufacturing environments, Hynix took delivery of the INOVA system in the last quarter of 2004.
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Citing cost considerations and system productivity as the key drivers of this purchasing decision, Mr. S. I. Sohn, general manager of the 300-mm Memory Manufacturing Fab at Hynix, said, "The INOVA xT carries the trademark productivity and technology advantages we've come to expect from Novellus. We're impressed by the system's flexibility, its quick process qualification, and by the production yields we're already experiencing in high-volume manufacturing in a very short period of time."
"PVD productivity is key to controlling metallization costs," said Dr. Rao Mulpuri, vice president and general manager of Novellus' Integrated Metals business unit. "We are very pleased that Hynix has chosen the INOVA xT for their production needs, and we look forward to working closely with this important customer on a variety of PVD aluminum manufacturing applications going forward."
Dr. Mulpuri also added, "With the successful introduction of aluminum processes on the INOVA xT platform, Novellus will begin to add more PVD applications in the near future to cover the needs of customers in both memory and logic."
Since its introduction in 2000, the INOVA xT 300-mm platform has consistently led the industry in technology and productivity for copper logic applications, but is now seeing significant market traction for PVD aluminum applications as well. Hynix is the fifth semiconductor company in Asia to select the Inova xT for advanced 300-mm manufacturing in the past four (4) quarters. |
