Applied Materials No-Politics Thread (AMAT) Message Board

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Applied Materials No-Politics Thread (AMAT)

AMAT 230.15

-3.2%

3:59 PM EST

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next

To: Bookdon who wrote (15187)	6/7/2005 1:27:09 PM
From: etchmeister	Read Replies (2) of 25522

"The introduction of new materials and processes at the 65-nm technology node has produced new classes of small defects that directly affect fab yield," said Gilad Almogy, vice president and general manager of Applied's Process Diagnostics and Control Group. "The UVision system has proven its value for critical chip layers, such as shallow trench isolation, contact, poly and gate etch, where chip makers have isolated killer defects not found with traditional brightfield tools." This sounds like integrated defect detection; (an etch step is followed by "real time" inspection). I'm not sure to what degree KLAC has integrated their tools into LRCX and NVLS processing tools

Report TOU Violation

Share This Post

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next