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Technology Stocks : General Lithography
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To: Yousef who wrote (563)9/10/1997 12:25:00 AM
From: Bob Pack   of 1305
 
Yousef, a quick thank you for your very useful reply. I will indeed have more questions about the current PR issues you raised in a day or so.

The reason I ask as you undoubtably know, but to inform others, is that advances in resist chemistry and processing is critical to the evolution and progression of all of the various lithographic techniques. 248nm has issues as you and Andrew described. At 193nm TSI is almost certainly required and may provide an even greater barrier/influence affecting 193nm stepper/scanner purchase. As Andrew pointed out in an earlier post, information relevant to investor decisions is difficult to obtain (rate of usage, type of chemistry, etc.) However... I certainly think such information will be of great use to informed investors as most people outside of the industry do not realize the leverage of the PR process in lithographic equipment purchase decisions.

Thanks again,
Bob
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