SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Technology Stocks : General Lithography

 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext  
To: Yousef who wrote (563)9/10/1997 12:31:00 AM
From: Andrew Vance   of 1305
 
Thanks for the technical explanation of what I alluded to. Nice to have a fellow techie around. Also, thanks for bringing the Anti-reflective coating issue to light. I admit that it slipped my mind. Furthermore, I am surprised that the cost of the resist has actually fallen to only 3X that of i-line. It used to be a higher delta.

Anyway, an excellent response that clearly shows why the emphasis is being placed to extend the useful life of i-line resist processing. Just a funny number to think about:

16 photo layers with no layers needing to be reworked.
On an 8" wafer (200mm) let's say 6 cc of resist is dispensed. Therefore, given 5% waste in a bottle, a one liter bottle of resist will coat 160 wafers or the equivalent of 10 fully processed wafers. At a cost of $2000 per 4 liters (gallon), you would have a cost of $2000 per 40 wafers processed or $50 per wafer versus a cost of roughly $17 per wafer for i-line. If you consider a normal manufacturing site having at least 3000 outs per week, you get a delta of $33,000 per week or $1.7 million in profit on just the cost of this one chemical. The depreciation of a DUV stepper is roughly 2X more than an i-line stepper per wafer processed. Add the BARC and other costs related to DUV and the $$$$ adds up. There is significant added costs to going DUV which impacts the bottom line.

Sorry for the verbose response but I felt a brief financial set of implications would complement the great technical response you gave.

Andrew
Report TOU ViolationShare This Post
 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext