IM Flash Technologies to buy all lithography tools from ASML
Friday, 06 January 2006
Fabtech.org
The recently formed NAND Flash joint venture IM Flash Technologies, between Intel Corp and Micron Technology Inc., is expected to order all lithography tool requirements that include critical and non-critical imaging layers from ASML, according to a research note issued today by Titus Menzies, a financial analyst with Jeffries International, based in London England.
Menzies believes that Nikon has had to prioritise advanced lithography tool orders for two key customers, Toshiba and Intel. The analyst stated that ASML could see more order/sales than previously expected in the second half of 2006 due to the timing of IM Flash's production ramp at that time. ASML could also benefit from strong orders from Samsung in the same time frame, according to the analyst in his research note.
Menzies also stated that he expects the company to report quarterly results in a couple of weeks that will show lithography tool shipments of 40 units, though with a higher percentage than previous quarters of 248nm KrF systems due to increased orders from foundries.
Micron outlined in its last quarterly conference call that NAND Flash production would be ramped first at its 300mm fab in Manassas, Virginia while its second 300mm fab in Lehi, Idaho is made ready for volume production early 2007. The company has stated that at least $500 million US dollars will be spent on capital equipment this year to start NAND production for the new joint venture. |
