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Technology Stocks : ASML Holding NV

ASML 1,423

-2.2%

Jan 30 9:30 AM EST

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To: Cary Salsberg who wrote (1079)	1/26/2006 3:20:34 PM
From: niek	Read Replies (2) of 43282

re: I think INTC is following a risky path. Most of their 193 nm dry lithography is done by Nikon tools. Wet lithography requires dual processing like ASML's Twinscan and Nikon's newest tool. I suspect that there is no way to modify their current dry tools for immersion. Most, all but INTC, will use immersion for 45 nm and 32 nm. INTC will use dry 193 nm tools for 45 nm and expect to use EUV for 32 nm. ASML has 2 EUV tools that will be shipped this year, most likely to INTC. Those tools will be even more expensive than immersion and INTC will be pioneering the EUV process. ASML has three EUV tools. One for IMEC, one for Albany Tech for delivery in Q2/Q306, and one in their own clean room for testing purposes. I think it's impossible to use 193-nm dry for mass production at 45-nm. It is not impossible to modify a dry 193-nm Twinscan for immersion. It takes at least a new lens system and a lot of control electronics. Anyway, i'm sure Intel will use immersion in the near future. From ASML!! Niek

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