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Technology Stocks : Advanced Micro Devices - Moderated (AMD)
AMD 259.68+2.3%3:59 PM EST

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To: combjelly who wrote (196869)5/15/2006 5:03:19 PM
From: Hans de VriesRead Replies (3) of 275872
 
Re:They have slated high-k and metal gates. These are major changes to the way chips are made

This was heralded as the major breakthrough for 45 nm
node not so long ago by Intel. They have since retracted and
it won't be used anymore at the 45nm node.

Interestingly AMD was first in applying metal gates to solve
the Fermi-level-pinning of the high-k gate stack and they
even tried to convince IBM in using it. for the 65nm node
AMD was leading the way here.

It now looks that high-k/metal gates will be used at the
next node (32 nm) with as main candidates HfO2 or HfSiO4
as the dielectricum and Tantalium, Molybdeen or Ruthium
for the metal gates. Probly combined with a treatment of
N or C to tune the gate workfunction at the interface,
with C looking particular good.

Regards, Hans
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