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Politics : Formerly About Applied Materials
AMAT 318.63-3.0%Feb 3 3:59 PM EST
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To: Rob-Chemist who wrote (8131)9/23/1997 7:37:00 PM
From: Big Bucks   of 70976
 
Thanks Rob,
Are you sure about being unable to etch copper using conventional
etching techniques?
Copper Chloride is a volatile byproduct of CL2+Cu chemistry in a plasma environment using reactive ion etching techniques with
a few other reactive gasses to control re-entrant "undercutting"
of the lines under the mask layer. True, copper has proved difficult
to etch but it should just be a matter of application of "known
chemistries" and methodologies to make it work. Am I wrong on this?

Please elaborate on the problems as you see them.
TIA

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