Applied Materials No-Politics Thread (AMAT) Message Board

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Technology Stocks : Applied Materials No-Politics Thread (AMAT)

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Nov 14 9:30 AM EST

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To: Big Bucks who wrote (20678)	9/17/2006 3:52:23 AM
From: niek	Read Replies (1) of 25522

re: but it won't be a simple matter of just plugging in a simple component to existing lithography tool sets and starting production. I'm fully aware of that BB. For instance, it took ASML more than seven years tot develope the current Twinscan concept. It took five years to develope the immersion tool and six years to develope the EUV tool. Right now ASML is developing a maskless lithotool in which they use the DLP's from Texas Instruments to focus the light on the wafer. ASML started in 2004 and wil complete the maskless lithosystem in about three years from now. But don't expect high transferrate's. It produces only 6 tot 10 wafers per hour. So, a maskless lithosystem could be usefull for prototype IC's, but not for mass prodection. It's not an easy job, because you need a datatransfer of about 300GB per second to drive the DLP's .... So I know exactly where I'm talking about.:) If ASML likes the nano antenna concept or not, I don't know yet, but if they do a working prototype will not be finished before 2015, where EUV probably ends. Niek

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