From Semiconductor Business News techweb.cmp.com
Story posted at 3:30 p.m. EDT/12:30 p.m. PDT, 10/3/97
Sematech aims for lithography consensus
AUSTIN, Tex.--Semiconductor industry consortium Sematech here today urged leaders in the chip industry to attend an advanced lithography workshop in Colorado Springs, Colo., next month as part of an effort to evaluate and narrow down options for next-generation wafer-stepper technology.
During the Nov. 4-7 meeting, Sematech hopes to build some kind of industry consensus on which advanced technologies are most likely to replace optical lithography for ICs with feature sizes below 0.18 micron. Currently, there are about a half dozen leading candidates for advanced lithography, each with a number of tradeoffs (see related lithography feature [http://techweb.cmp.com/sbn/pub/0797/litho.htm ]) from SBN's July monthly publication).
To make the so-called "decision of the century," Sematech has invited 100 of the top lithography experts and managers from chip companies, exposure tool suppliers and mask makers to join lithography R&D experts and university researchers from around the world.
[I wonder if Cymer is one of these invitees?]
"This is a critical meeting for advanced lithography," said Karen Brown, Sematech's director of lithography. "We want to be sure that the industry is fully informed. We see the role of Sematech, the sponsor for the meeting, as facilitating the exchange of information and data about the various advanced lithography options.
"The data exchange and discussion will lead to improved programs in all of the options, as the world's best lithography experts will be inputting their comments," said Brown, referring to the meeting's agenda. "In addition, the workshop should also help crystallize the problems which are common across all of the options, and define programs for their solution."
The development of a new exposure tool technology for volume manufacturing - and the resist, mask and metrology technology to support it -- is expected to cost more than$1 billion and require an estimated 8-10 years of research and development, according to Sematech.
[Note that: 8-10 years! So much for Cymer's franchise being good for only 2-3 years.]
The most likely technologies to replace optical lithography are proximity x-ray, electron-beam projection, electron-beam direct write, extreme ultraviolet, and ion projection, said Sematech.
"Due to the extensive time and cost required to develop any new lithography system, it is critical that the industry understand the risks related to each technology," said Brown. |
