Align-Rite Int'l (MASK) Undervalued compared to PLAB DPMI Message Board

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Technology Stocks : Align-Rite Int'l (MASK) Undervalued compared to PLAB DPMI

PLAB 21.71

-4.3%

Nov 7 9:30 AM EST

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To: tom pope who wrote (92)	10/3/1997 8:19:00 PM
From: Bookdon	of 388

Masks are going to require smaller line-widths as well. Since mask images are usually 5 times larger than those on the wafer, this has not been a problem for the mask PROCESS (the photoresist, development, and etching of the chromium on the photomask "blank") in the past. But we have now (sub-0.25 micron features on the wafer) reached the point where the resist and process used for photomasks will need to change. For laser-based mask-making tools this is not a big problem, since processes used for earlier generations of wafer exposure tools (stepper) can be used (the mask-making tools use the same kinds of lasers that the steppers use), and that work has been done. The problems will be for the next generation electron-beam tools, since those resists and processes have NOT be developed. At this point, that only affects DPMI and Photronics, because they have been adding next-generation electron beam tools to their equipment bases. MASK has not. This may turn out to be a profitable choice for MASK>

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