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Technology Stocks : Cymer (CYMI)

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To: Tulvio Durand who wrote (4975)	10/11/1997 8:28:00 PM
From: BillyG	of 25960

James, please explain They still havent solved the biggest problems with x-ray lighography. Those are all associated with the reticles. They must be made with 5 times greater accuracy than stepper reticles. Why five times greater accuracy? Are reticles really needed? Reticles that are used for photolithography are made much larger than than the chip die, and the light pattern is focused down (reduced) to the wafers. In this way a small imperfection in the reticle is reduced to a much smaller imperfection in the exposure pattern on the wafer. If X-rays cannot be focused (I don't know the answer to this issue), then the reticle must be the same size as the pattern on the wafer. Therefore, imperfections in the reticle show up as the same size imperfections in the X-ray exposure pattern on the wafer. There is no reduction effect without focusing. Couldn't an aim-shoot-reaim-shoot technique be substituted with which to create a map of XRL aim coordinates that are stored in computer memory? This is direct-write lithography. You are talking about writing every line on the wafer, without a mask. It is done, but it is very time consuming and not suitable for high volume mass production.

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