SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Technology Stocks : Align-Rite Int'l (MASK) Undervalued compared to PLAB DPMI
PLAB 21.71-4.3%Nov 7 9:30 AM EST
 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext  
To: Bookdon who wrote (106)10/13/1997 8:50:00 PM
From: Doug Rife   of 388
 
Interesting but what about complexity. My understanding is that GaAs devices cannot yet be made at the large die sizes of Si devices.

I was aware that direct-write electron-beam lithography is used in very high performance applications where cost is not an issue such as for military parts. But it's still way too expensive for the mass market. The author of the Physics Today article I mentioned claims to have invented a non-scanning electron lithography technique which he boasts can expose 1 acre of wafers per year. Yet even at this rate he feels the method is too slow for the mass market and it will be 10 years before it's widely used.
Report TOU ViolationShare This Post
 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext  

HomeMailHotSubjectMarksPeopleMarksKeepersSettings
Terms Of UseContact UsCopyright/IP PolicyPrivacy PolicyAbout UsFAQAdvertise on SI
© 2025 Knight Sac Media.  Data provided by Twelve Data, Alpha Vantage, and CityFALCON News