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Technology Stocks : Cymer (CYMI)
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To: ForYourEyesOnly who wrote (8961)11/11/1997 1:16:00 AM
From: Yousef  Read Replies (1) of 25960
 
THC,

Re: "Many manufacturers have found the switch to DUV to
be difficult ..."

We have done a source inspection which includes printing wafers for
resolution and overlay (checks both alignment and distortion). Our
machine easily met specifications ... this is classic Nikon, they set
very conservative specs that they meet 99.5% of the time.

BTW, I am more concerned with selecting a DUV resist and determining
whether to use a BARC (Bottom Anti Relecting Layer) on a number of
different surfaces (poly, TiN, Si3N4, SiO2 ...). Each of these surfaces
will have to be optimized with the litho and etch processes. I'm expecting
the DUV exposure tool to operate very smoothly.

Yousef
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