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Technology Stocks : Novellus
NVLS 2.400+2.1%Jul 24 5:00 PM EST
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From: etchmeister12/15/2011 7:56:39 PM
   of 3813
 
Sharing 450mm platform development should also be a significant advantage; besides they might be able to "mix and match" etch and deposition processing chambers.
And remember before you can etch it it must be deposited and there can be interaction between properties of the film being deposited and the etch process.
Integration means to me to optimize deposition and etch simultaneously rather than separately.
Actually that goes in similar direction like AMAT's "total solutions".
I think for now Mr. Market is somewhat confused.
Another good example is TSV which also requires both dep and etch.
blogs.barrons.com
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