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Technology Stocks : Novellus

NVLS 2.400

+2.1%

Jul 24 5:00 PM EST

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To: etchmeister who wrote (3796)	12/29/2011 12:48:11 PM
From: etchmeister	Read Replies (2) of 3813

one of the key leading edge applications is double patterning NAND flash, with the critical dimensions and layout, will continue to drive lithography using double-patterning, and perhaps triple-patterning. Atomic layer deposition (ALD) tools will be challenged to deposit films as thin as 4nm to achieve the proper gate dimensions and device electrical characteristics. The number of electrons on the gate continues to shrink, making reliability and repeatability of deposition and etch processes critical to NAND yields. 2xnm and 1xnm NAND are expected to be roughly 4% of the 19,000 Petabytes total production in 2012 electroiq.com

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