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From: FJB9/29/2012 6:28:09 AM
1 Recommendation  Read Replies (2) of 5867
 
New method monitors semiconductor etching as it happens—with light

September 28, 2012 by Liz Ahlberg Enlarge
This is a three-dimensional image of the University of Illinois logo etched into a gallium-arsenide semiconductor, taken during etching with a new microscopy technique that monitors the etching process on the nanometer scale. The height difference between the orange and purple regions is approximately 250 nanometers. Credit: Chris Edwards, Amir Arbabi, Gabriel Popescu, and Lynford Goddard

(Phys.org)—University of Illinois researchers have a new low-cost method to carve delicate features onto semiconductor wafers using light – and watch as it happens. Ads by Google Chemical Etching Mfg. - Specializing in PhotoChemical Etching - www.cmrmfg.com "You can use light to image the topography and you can use light to sculpture the topography," said electrical and computer engineering professor Gabriel Popescu. "It could change the future of semiconductor etching."

Cont...

Read more at: phys.org
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