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Technology Stocks : Applied Materials No-Politics Thread (AMAT)
AMAT 226.19-3.2%1:16 PM EST
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From: Gottfried4/20/2015 8:26:18 PM
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Applied Materials' New Photomask Etch System Enables the Extension of Multiple Patterning to 10nm and Beyond

SANTA CLARA, Calif., April 20, 2015 - Applied Materials today announced the Applied Centura® Tetra(TM) Z Photomask Etch system for etching next-generation optical lithographic photomasks needed by the industry to continue multiple patterning scaling to the 10nm node and beyond. The new tool extends the capabilities of Applied's industry-leading Tetra platform, delivering angstrom-level photomask accuracy for critical dimension (CD) parameters required to meet stringent patterning specifications for future logic and memory devices.[snip]

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