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Technology Stocks : Cymer (CYMI)

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To: Cymeed who wrote (11963)	12/26/1997 11:24:00 AM
From: Gary Hoyer	Read Replies (2) of 25960

Regarding the reported Japanese Ion-beam doping breakthrough: After reading the Mercury News article I can tell all Cymer investors not to worry. The reported breakthrough is in the area of silicon doping using ion-beam implanters and has nothing to do with the lithography step. A long time ago I used to operate an ion-beam implanter at an old Burroughs fab. Ion-beam implanters are used to dope silicon with impurities to make it either a conductor or an insulator. The breakthrough allows doping at a much finer line-width, which is good news. However, the breakthrough has nothing to do with creating the super-fine (.05 micron) patterns or masks on the wafer! This line-width is in the realm of X-ray or EUV, something that is still experimental. So the bottom line is that this Japanese advance is just one of several MAJOR advances that needs to take place in order to actually build sub .1 micron chips. IMO, the bottleneck is still going to be the lithography step as the technology beyond DUV is not yet clear. Hope this sheds some light, Gary.

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