JMAR Industries Awarded $1.3 Million in New DARPA Funding to Initiate
Construction of X-ray Lithography Point Source Demonstration System (emphasis added)
SAN DIEGO--(BUSINESS WIRE)--Jan. 13, 1998--JMAR Industries Inc.
(Nasdaq/NM: JMAR) Tuesday announced that it has been awarded $1.3 million in
new funding from the Defense Advanced Research Projects Agency (DARPA) to
procure long lead-time items necessary to construct an X-ray lithography point source
demonstration system this year.
The award is the first installment of a new, larger contract that JMAR expects to receive during the first quarter of 1998. The system JMAR will produce under this contract will be used to demonstrate JMAR's compact PXS X-ray "light source" which the company believes will provide the semiconductor industry with the basis for
low cost manufacturing of the higher performance microchipsrequired for future military and commercial electronic systems.
"The need for smaller, more powerful semiconductors continues to intensify and with
that so does the need for more advanced manufacturing solutions," noted John S.
Martinez, JMAR's chairman and chief executive officer. "Lithography is one of the
most critical steps in the production of semiconductors. It is a photographic process
which copies intricate computer-generated electronic circuit designs onto the
semiconductor chips."
Martinez continued: "To produce the high performance electronic systems of
tomorrow, manufacturers need a cost effective way to squeeze more electrical circuits
into smaller spaces.
"JMAR's research during the past several years provides strong evidence
that a workstation using our PXS X-ray lithography source could provide an
economical way to gain dramatic increases in circuit densities, hence
performance, by reducing circuit feature sizes to 0.13 microns and below."
The PXS architecture includes both pulse generating and amplifier lasers based on
JMAR's high-performance proprietary solid state Britelight laser technology to
produce 30 to 90 watts of the type of X-rays required for optimum lithographic
exposures.
During 1998 JMAR expects to integrate its PXS with an aligner being
developed under other DARPA programs to create a complete X-ray
lithography workstation no larger than current optical lithography systems.
"Safe Harbor" Statement under the Private Securities Litigation Reform Act of 1995:
The statements regarding future sales and earnings growth and the projects or
processes currently under development are forward-looking statements that involve
risks and uncertainties that could cause actual results to differ materially from those set
forth in the forward-looking statements, including delays in technology or product
developments, shipment or cancellation of orders, timing of future orders, customer
reorganizations, fluctuations in demand and the other risks detailed from time-to-time in
the company's reports which are filed with the Securities and Exchange Commission.
JMAR Industries develops, manufactures and markets precision measurement, process
control and manufacturing systems and laser products for the microelectronics and
medical industries and is a leading developer of advanced lithography sources for
production of higher performance semiconductors.
For more details on JMAR's lithography program and its relationship to the advanced
lithography programs conducted elsewhere refer to the company home page at:
www.jmar.com .
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CONTACT:
JMAR Industries Inc.
Dennis E. Valentine, 619/535-1706
jmar.com
or
Silverman Heller Associates
Eugene Heller/Glenn Schoenfeld
310/208-2550
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