DuPont Photomasks Installs First Merchant MEBES-R- 4500S at Ichon, Korea, Facility
ROUND ROCK, Texas--(BUSINESS WIRE)--Jan. 26, 1998--DuPont Photomasks, Inc. (NASDAQ: DPMI - news), more commonly referred to as DPI, announced today that it has completed installation of a new photomask manufacturing line at its Ichon, Korea, production facility anchored by a MEBES(R) 4500S electron beam pattern generator. The new line represents a total capital investment of nearly $15 million.
The MEBES 4500S is currently the most advanced commercially available e-beam writing tool in the world. DPI is the first merchant photomask manufacturer in the world to install the new tool from Etec Systems, Inc. (NASDAQ:ETEC - news). DPI will use the new system to produce the most critical layers of photomasks for leading-edge semiconductors employing design rules at or below 0.25 micron.
''Despite the recent economic difficulties in the Asia/Pacific region, demand for advanced photomasks to produce leading-edge semiconductors remains strong,'' said Chulwoo Won, DPI's executive vice president of Asia/Pacific operations. ''DPI is making the necessary capital investments to ensure that we will be able to continue to address the needs of our customers across the Asian market.''
The MEBES 4500S improves the accuracy and throughput of Etec's proven MEBES 4500 e-beam pattern generator. The new system's advanced features include special support for the production of photomasks with Optical Proximity Correction (OPC) and phase shift features. OPC and phase shift techniques are used to provide the required depth of focus and critical dimension control necessary to fabricate semiconductor devices with deep sub-micron feature sizes.
The Semiconductor Industry Association's recently revised technology roadmap confirms the relentless drive by semiconductor producers to miniaturize features at a faster rate than previously believed possible. According to the roadmap, production of 64-Mbit DRAMs is anticipated to ramp this year while 256-Mbit DRAMs will begin
sampling. Advanced photomasks manufactured by DPI, including those utilizing OPC and phase shift techniques, are helping to enable semiconductor producers achieve those milestones....
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Best regards,
PD |
