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Technology Stocks : Cymer (CYMI)
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To: fellow who wrote (13321)1/28/1998 11:13:00 PM
From: ForYourEyesOnly  Read Replies (1) of 25960
 
1/4um devices using i-line:

Fujitsu published a new paper about a resist technology to use i-line at 1/4um.

They use a layer of standard photoresist for planarization of the features, and then a second layer of Si-doped resist for the pattering.

This technique is similar to the one using a BARC (bottom anti reflection coating) and a second layer of resist.

Do any of our litho experts know about how this will fair in the market?

Fujistu is now trying to market this resist.

Good luck,

THC
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