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To: TideGlider who wrote (14419)2/8/1998 8:19:00 PM
From: Tulvio Durand  Read Replies (1) of 25960
 
The referenced article makes a strong case for substituting wide field (1X, 2X or 2.5X) i-line tools in place of reduction (5X) i-line tools for use in conjunction with DUV tools in the mix-and-match technique for making ICs with sub 0.25 micron critical dimensions. Doing so would make the 5X i-line tools idle in newer mix-and-match fabs. I suppose these tools could be used elsewhere (ie., to print lesser performing ICs), but I wonder if they could instead be retrofitted with DUV excimer lasers to make low-cost DUV tools? Tulvio Ref: 208.208.73.42
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