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Politics : Formerly About Advanced Micro Devices
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To: Petz who wrote (28773)2/24/1998 6:05:00 PM
From: Paul Engel  Read Replies (1) of 1572735
 
Petz - Re:"Does someone on the thread know what minimum spacing is used between "traces" on the metallization layers of an Intel"

This varies from layer to layer, depending upon the thickness of a particular metal layer.

For Intel's 0.25 micron process, their thinnest layer is the first metal layer - for the highest density interconnect. I believe they use a metal line width of about 0.32 microns and 0.32 micron spacing between lines.

The top metal layer, used more for power distribution is thicker and Intel uses 1.25 micron lines and 1.25 micron spaces.

Paul
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