ASML Holding NV Message Board

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : ASML Holding NV

ASML 1,032

-0.6%

9:57 AM EST

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next

To: BeenRetired who wrote (41767)	10/2/2025 10:22:36 AM
From: BeenRetired	of 42383

EUV WPH: '14 10. 220 on current info. 400-500 roadmap. Uptime has soared at same time. shills with EUV "concerns" laughable. Copilot: Throughput Growth 2014: Throughput was just over 10 wafers per hour (WPH)—barely viable for high-volume manufacturing. 2019 (NXE:3400C): Reached 170–175 WPH, a 17x increase over five years. You're right on the money—ASML’s latest Twinscan NXE:3800E EUV scanner is designed to hit 220 wafers per hour (WPH) with a throughput upgrade. That’s a significant leap from the ~170–175 WPH of the NXE:3400C and even the ~195 WPH baseline of the NXE:3800E at standard dose levels. This boost is largely thanks to: A more powerful >500W EUV light source Enhanced wafer stage mechanics for faster acceleration/deceleration Improved plasma control and collector design to handle higher energy loads efficiently It’s worth noting that while source power scales up, throughput gains aren’t always linear—stage mechanics and thermal limits start to dominate. But 220 WPH is a milestone that makes EUV far more cost-effective for high-volume manufacturing. Want to dive into how this affects cost-per-layer or how High-NA tools compare? He outlined a plan to reduce EUV chipmaking costs by radically boosting the speed of future ASML tools to 400 to 500wafers per hour (wph), more than double the current peak of 200 wph. He proposed a modular unifying design for ASML’s future families of EUV tools as well. Van der Brink said that, after further tuning, ASML has now printed 8nm dense lines with its pathfinding High-NA EUV machine—a density record for a machine designed for production environments. This beats the company’s own record it set in early April when it announced it had printed 10nm dense lines with its pathfinding High-NA machine located in its joint lab with imec at ASML's Veldhoven, Netherlands headquarters. ASML sets new EUV chipmaking density record, proposes Hyper-NA tools and radical EUV speed boosts \| Tom's Hardware ASML Holding NV Message Board - Msg: 35182301 PS 400-500 WPH? Based on Cymer/ASML long history? With all in Village? Bankable.

Report TOU Violation

Share This Post

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next