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Technology Stocks : General Lithography
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To: Andrew Vance who wrote (813)3/2/1998 12:46:00 PM
From: Volsi Mimir  Read Replies (2) of 1305
 
AV IMHO the paragraph about measuring errors in masks is a focus. I will watch for a company to do that and profit with them:

Semiconductor Online article
"According to Sheldon, defects are the most serious problem with phase shift masks. No tools are available to inspect masks at the exposure wavelength, so it's very difficult to identify phase defects. The etch process prevents 180ø phase errors, but smaller errors, while less serious, are more difficult to detect. "

No mention of Cymer; must be a given to this field that there is no other to use.

Good Day
eddyb
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