CYMI press release! Should have delayed it one day...........
Don't miss the comment on post-optical technologies. This is not a one-product company!
biz.yahoo.com
Thursday March 5, 2:59 pm Eastern Time
Company Press Release
Cymer's Laser Used in Startling Chip Advance Reported by the
University of Texas Research Team
Next-Generation Laser Provides Enabling Technology for the
Production of Industry's First 0.08 Micron Devices
SAN DIEGO--(BUSINESS WIRE)--March 5, 1998--Cymer Inc. (NASDAQ/NMS:CYMI - news), the world's leading
supplier of the excimer laser illumination sources essential for deep ultraviolet (DUV) photolithography, today announced that
its next-generation argon fluoride (ArF) excimer laser was the DUV illumination source used to achieve the breakthrough 0.08
micron design rules recently reported by the University of Texas at Austin.
These atomic level feature sizes, which are just 320 atoms wide or less than 1/25,000 of an inch, could enable the production
of integrated circuits (ICs) that are up to 60 percent smaller than the size of today's most sophisticated microprocessors with
between 10 to 100 times the performance. Many experts agree that this poses staggering potential for the faster, smaller,
higher performing chips end-users seek at increasingly lower costs.
The University of Texas graduate research team's breakthrough was made possible through advances in several key areas.
DuPont Photomasks Inc. (DPI) provided an etched quartz phase shift photomask, which contained the precision images of the
features to be patterned on the wafer. The University of Texas created a new photoresist chemical combination, an amorphous
polyolefin, that interacted with the laser light source to pattern the image.
This new photoresist, which took over three years to develop, was designed to work specifically with Integrated Solutions
Inc.'s (ISI) DUV ArF MicroStep(TM) 193 nm wafer stepper. The ISI wafer stepper features Cymer's next-generation ArF
laser, thus enabling the extendibility of DUV lithography to address manufacturing requirements through the next decade. The
project was funded through SEMATECH, a non-profit research consortium of 10 leading semiconductor manufacturers.
Cymer's President and Chief Executive Officer Robert Akins noted: ''Cymer's role in enabling this revolutionary IC advance
further validates the strength and longevity of our illumination source technology. The combination of advanced mask making
strategies, a new photoresist recipe, an advanced 193 nm DUV stepper and Cymer's leading ArF laser source has the
potential to extend existing DUV optical lithography as a viable and cost-effective imaging solution well into the next century.''
Akins added that the laser used in the research project represents the company's shortest wavelength laser technology to date.
Building upon Cymer's production-proven krypton fluoride (KrF) technology, the ArF illumination source offers the resolution,
depth of focus and critical dimension control needed to image patterns down to 0.10 micron and below. Currently, Cymer
maintains over an 80 percent share of the excimer laser market, with over 230 KrF lasers in production at almost all major
chipmaking labs worldwide. To ensure its continued market leadership in the laser arena, Cymer is developing a suite of laser
products for the full range of advanced DUV requirements, as well as future technologies for post-optical lithography
strategies.
Cymer Inc. is the leading provider of excimer laser illumination sources for use in deep ultraviolet (DUV) photolithography
systems targeted at the pilot and production segments of the semiconductor manufacturing market. Further information on
Cymer may be obtained from the company's SEC filings, the Internet at cymer.com or by contacting the company
directly.
Contact:
Cymer Inc.
Leslie Cole, 619/451-7149
or
MCA Inc.
Marie Labrie, 650/968-8900 |
