cymer -- it's official:
Cymer's Laser Used in Startling Chip Advance Reported by the University
of Texas Research Team
Next-Generation Laser Provides Enabling Technology for the
Production of Industry's First 0.08 Micron Devices
SAN DIEGO--(BUSINESS WIRE)--March 5, 1998--Cymer Inc. (NASDAQ/NMS:CYMI -
news), the world's leading supplier of the excimer laser illumination
sources essential for deep ultraviolet (DUV) photolithography, today
announced that its next-generation argon fluoride (ArF) excimer laser
was the DUV illumination source used to achieve the breakthrough 0.08
micron design rules recently reported by the University of Texas at
Austin.
These atomic level feature sizes, which are just 320 atoms wide or less
than 1/25,000 of an inch, could enable the production of integrated
circuits (ICs) that are up to 60 percent smaller than the size of
today's most sophisticated microprocessors with between 10 to 100 times
the performance. Many experts agree that this poses staggering potential
for the faster, smaller, higher performing chips end-users seek at
increasingly lower costs.
The University of Texas graduate research team's breakthrough was made
possible through advances in several key areas. DuPont Photomasks Inc.
(DPI) provided an etched quartz phase shift photomask, which contained
the precision images of the features to be patterned on the wafer. The
University of Texas created a new photoresist chemical combination, an
amorphous polyolefin, that interacted with the laser light source to
pattern the image.
This new photoresist, which took over three years to develop, was
designed to work specifically with Integrated Solutions Inc.'s (ISI) DUV
ArF MicroStep(TM) 193 nm wafer stepper. The ISI wafer stepper features
Cymer's next-generation ArF laser, thus enabling the extendibility of
DUV lithography to address manufacturing requirements through the next
decade. The project was funded through SEMATECH, a non-profit research
consortium of 10 leading semiconductor manufacturers.
Cymer's President and Chief Executive Officer Robert Akins noted:
''Cymer's role in enabling this revolutionary IC advance further
validates the strength and longevity of our illumination source
technology. The combination of advanced mask making strategies, a new
photoresist recipe, an advanced 193 nm DUV stepper and Cymer's leading
ArF laser source has the potential to extend existing DUV optical
lithography as a viable and cost-effective imaging solution well into
the next century.''
Akins added that the laser used in the research project represents the
company's shortest wavelength laser technology to date. Building upon
Cymer's production-proven krypton fluoride (KrF) technology, the ArF
illumination source offers the resolution, depth of focus and critical
dimension control needed to image patterns down to 0.10 micron and
below. Currently, Cymer maintains over an 80 percent share of the
excimer laser market, with over 230 KrF lasers in production at almost
all major chipmaking labs worldwide. To ensure its continued market
leadership in the laser arena, Cymer is developing a suite of laser
products for the full range of advanced DUV requirements, as well as
future technologies for post-optical lithography strategies.
Cymer Inc. is the leading provider of excimer laser illumination sources
for use in deep ultraviolet (DUV) photolithography systems targeted at
the pilot and production segments of the semiconductor manufacturing
market. Further information on Cymer may be obtained from the company's
SEC filings, the Internet at cymer.com or by contacting the
company directly.
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Contact:
Cymer Inc.
Leslie Cole, 619/451-7149
or
MCA Inc.
Marie Labrie, 650/968-8900 |
