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Technology Stocks : Dupont Photomasks (DPMI)

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To: Duane L. Olson who wrote (365)3/14/1998 8:25:00 PM
From: Larry Brew  Read Replies (4) of 955
 
Duane, << UT announcement and below .18u processing >>

DPMI has a winner. Sub .18 was previously projected as needing
X-ray or ebeam processing, significantly requiring excessive upgrade
costs for processing. Although the mask costs are much higher than
I realized, it's cheap when one considers no other equipment upgrades
are necessary. I believe current Deep UV is 193 nanometers. Dropping
to the near 50 nanometer range puts you into x-ray, a hole new safety
factor. If DUV can be accomplished with these new masks, that I admit
of no knowledge to how they're made, DPMI, hopefully holding the patent, will walk semis well into the future.
I'm tempted to pump a TI fellow friend at TI on the subject of
these masks. It's his field in .15 and below development. It would
really be better if we could get inputs from a DPMI employee on the
project. I'm sure the concepts are public info, but my curiosity now
has me intrigued. Later -- Larry
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