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Technology Stocks : Dupont Photomasks (DPMI)

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To: Katherine Derbyshire who wrote (396)3/19/1998 3:30:00 PM
From: Larry Brew  Read Replies (2) of 955
 
Katherine, << I stand corrected on 193nm >>

Although TI is working with 193nm, you are correct as it is not
yet in production. It's working with the next generation c6x and
drams. I know .18 dram prototypes are being evaluated at IBM, strongly
suggesting 193nm processing. The below is from the Cymer web site.
I apologize to all for the mis-communication. Also, X-ray being
attractive from my point of view was not suggesting it to be the
next generation. Most likely ebeam. CYMI abstract below.

Excimer lasers are recognized throughout the semiconductor industry as the light source replacement for mercury arc lamps. Increasingly, chipmakers are relying on excimer lasers as the illumination source for volume production of semiconductors with critical geometries below 0.35 micron (æm). According to the Semiconductor Industry Association's Technology Roadmap, leading-edge 0.25æm devices will be produced in volume by 1998 and 0.18æm devices will be in production by 2001, making the excimer laser key to the next several generations of chips.

Next-Generation Technology

Progress in laser technology for semiconductor manufacturing can be measured by a reduction in light wavelength. Currently, KrF lasers with a 248 nanometer (nm) wavelength are used to produce chips with critical features of 0.35æm and smaller.

Future generations of lithography systems are expected to use a 193nm argon fluoride laser (ArF) to achieve 0.18æm and smaller features. Cymer, in conjunction with its customers, has embarked on an extensive R&D program to develop ArF lasers and other next-generation illumination technologies for use on the manufacturing floor.
Larry
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