Aloha, I just received the April edition of Semi Business News. Theres a very good article on optical litho & CYMI here's a excerpt.
" For now, optical techniques keep stretching out. AMD's Siegle saw no reason why 193nm lithography with phase-shift masks and other optical tricks wouldn't extend optical through 0.1-micron production processing. " Once 193-nm lasers and photoresists are perfected for production systems, 0.1-micron becomes practical"
MIT is now working to achieve 0.07 line widths with a production system. " Rothchild said it is using a long proven production tool - a full size 22-x-32-mm field size step and scan system, the SVG Lithography Micrascan-II with the Cymer 193-nm laser.
"It now looks as if optical lithography production system will reach 0.07-micron feature size, pushing out of the way advanced technology contenders such as X-ray, extreme ultraviolet, direct write e-beam, and ion beam projection"
To summarize " To create a finer line you need the finest, purest light source..." We know who has it, now it's about time everyone else does too! Go CYMER
Nigel |
