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To: Gemini who wrote (16328)4/4/1998 3:02:00 AM
From: neverenough  Read Replies (1) of 25960
 
Allan,

Here's a couple of more tid bits,

" So where does all this leave the half-dozen advanced lithography technologies like X-ray and e-beam? MIT's Rothchild questioned whether they would even be needed for semiconductor production now. If lithography ultimately gives out at feature sizes below 0.05 micron, as many researchers expect it to, then a revolutionary new process would have to be developed."

It also states that MIT is making it's first 157-nm processing tests using a limited field-of-view stepper that's built in it's own laboratory with a fluoride F2 laser. The laser is operated at 8 watts at a 200-MHz rate. He also noted that calcium fluoride lenses appeared to be more robust than fused silica at 157-nm.

Nigel
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