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To: D. K. G. who wrote (17230)5/1/1998 4:35:00 PM
From: Starlight  Read Replies (4) of 25960
 
From the latest issue of the SAL newsletter, it states:

Mask costs for leading-edge 193 nm DUV optical masks (with PSM/OPC features) will escalate rapidly at the 180 nm design rule generation and will become non-competitive with post optical alternatives at 130 nm design rules. A Sematech cost model shows that 130 nm design rule masks for 193 nm lithography will cost about $100,000, x-ray masks will cost $45,000.
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