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To: Starlight who wrote (17301)5/2/1998 12:35:00 PM
From: FJB  Read Replies (2) of 25960
 
248nm scanners can be used from 0.25 to 0.15. 193nm scanners can be used from 0.13 to possibly 0.07.

So where does all this leave the half-dozen advanced lithography technologies like X-ray and e-beam? MIT's Rothschild questioned whether they would even be needed for semiconductor production now. If lithography ultimately gives out at feature sizes below 0.05 micron, as many researchers expect it to, then a revolutionary new process would have to be developed. As for the final 0.05- micron chip generation on the Semiconductor Industry Association's current new technology roadmap, Rothschild doubted that any of the existing non-optical tools in development would be deployed for just one generation.
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