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Technology Stocks : General Lithography

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To: Andrew Vance who wrote (985)	5/11/1998 6:55:00 PM
From: nigel bates	Read Replies (1) of 1305

A member of the next food chain ? - TROY, Mich., May 11 /PRNewswire/ -- OSMIC Inc. announced today its selection as a commercial supplier by the Extreme Ultraviolet Lithography Limited Liability Corporation (EUV LLC). Osmic was awarded a contract for 300 reflection mask blanks to be used in developing extreme ultraviolet lithography (EUVL). This next generation lithography technology will enable production of integrated circuits (ICs) which offer orders of magnitude increase in speed and capacity over today's most advanced ICs. Osmic will use its recently installed fully automated in-line system to coat large silicon wafers with a multilayered EUV reflecting film for use as mask blanks in patterning experiments. The contract represents a portion of reflection mask blanks to be used for the EUV LLC's early R&D phase. Osmic will be working in cooperation with the EUV LLC and Virtual National Labs (VNL) to reduce particulate contamination in the multilayer coatings. Any particulate contamination will cause defects in the final ICs. Defect-free multilayer coatings are the ultimate goal for EUVL. Go for 1000 Nig

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